500nm Magnification Calibration Diffraction Grating Replica 70 Convenient for handling membranes or

Convenient for handling membranes or sheets

#5367-5DLC

200nm Thermal Oxide on ø6" Ultra-Flat Wafer

Storage under vacuum eliminates contamination or dust and is ideal to preserve hygroscopic samples

500nm Magnification Calibration Diffraction Grating Replica 70 Convenient for handling membranes orDESCRIPTION Carbon replica with Au Pd shadowing on a cross line grating with well defined trench type grooves. Pitch or "d" spacing for parallel line grating is 500nm. The trench type groove makes it easy to measure the pitch. Typically, cross line grating is used up to 100,000x with 2,000 lines mm in both directions. Instructions included. Made on a G400, 400 square mesh copper grid. PELCO Technical Notes, 2000 l mm Cross Line Grating Replica,